Cluster Sputter
¢¹ Suitable for automated production lines and R&D systems
¢¹ Provides highly integrated technology and mechanisms
Applications
- Applicable to various thin film (metal, oxides, TCO) processes
- Applicable to highly integrated semiconductor and electronic component substrate processes
- Applicable to thin-film solar cell manufacturing processes
- Applicable to highly integrated semiconductor and electronic component substrate processes
- Applicable to thin-film solar cell manufacturing processes
Specifications
Configuration | Loading, Transfer, Pre-treatment, Deposition(PVD, CVD) |
Transfer | Hi-vacuum automatic robot |
Cathode | Planar or Round Magnetron cathode |
Target | Metal, Oxide, TCO |