<

Vacuum Parts and Alloy Targets for Sputtering

  • 진공 부품 및 Sputtering용 Alloy Target
  • 진공 부품 및 Sputtering용 Alloy Target
  • 진공 부품 및 Sputtering용 Alloy Target

▷ Self-made alloy targets for efficient and reliable cathode sputtering.
▷ Supply organic/inorganic deposition sources and related components.

Sputtering Cathode
- Type : Planar, Round, Hexagon, Cylindrical type magnetron gun
- Size : up to 2,000mm
- Target Material : Metal, Oxide, TCO.
Sputtering Target
- Target Material : Metal (Silver, Gold, Titan Color용)
Evaporation Source
- Type : Point cell, Linear cell
- Volume : Host and Dopant (from 3cc ~ )
- Material : Organic and Inorganic material