Inline System
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Specification
Deposition Type | In-Line Horizontal Type |
Substrate Size | Mass : ~ Gen.5.5 R&D ~ P/P : ~ Gen.2 |
Tact Time | Mass : 2mins R&D ~ P/P : 30mins |
Evaporation Source | Mass : Linear Source R&D ~ P/P : Parallel Shot by Point Source |
Thickness Uniformity | Organic : ¡Â¡¾ 3%(Organic), ¡Â¡¾ 4%(Metal) |
Align Accuracy | Mechanical Align : ¡Â¡¾ 150§ |