Cluster Sputter
¢¹ ÀÚµ¿ÈµÈ »ý»ê¶óÀÎÀ̳ª °³¹ß ¹× ¿¬±¸ÇöÀå µî¿¡ ÀûÇÕÇÑ System
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Application
- ´Ù¾çÇÑ ¹Ú¸·(Metal, Oxide, TCO)°øÁ¤¿¡ Àû¿ë
- °íÁýÀû ¹ÝµµÃ¼ ¹× ÀüÀÚºÎÇ° ±âÆÇ °øÁ¤
- ¹Ú¸·Å¾çÀüÁö Á¦Á¶ °øÁ¤
- °íÁýÀû ¹ÝµµÃ¼ ¹× ÀüÀÚºÎÇ° ±âÆÇ °øÁ¤
- ¹Ú¸·Å¾çÀüÁö Á¦Á¶ °øÁ¤
Specification
±¸¼º | Loading, Transfer, Pre-treatment, Deposition(PVD, CVD) |
Á¦Ç° ÀÌ¼Û | °íÁø°ø ÀÚµ¿ Robot |
Cathode | Planar or Round Magnetron cathode |
Target | Metal, Oxide, TCO |