Batch Sputter
¢¹ ´Ù¾çÇÑ ¹Ú¸·ÁõÂøÀÌ °¡´ÉÇÏ¿© ¿¬±¸°³¹ß¿ëÀ¸·Î ÀûÇÕÇÑ ½Ã½ºÅÛ
Application
- °íÁýÀû ÀüÀÚºÎǰ ¹× ±¤¼ÒÀÚ¿ë ºÎǰ
- °í°æµµ¸· ÄÚÆÃ
- °í°æµµ¸· ÄÚÆÃ
Specification
| ±¸¼º | Pre-treatment, Deposition |
| Ư¡ | Drum type, Dual-side deposition |
| Cathode | Planar Magnetron cathode |
| Target | Metal, Oxide, TCO |

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