진공 부품 및 Sputtering용 Alloy Target
홈 
제품소개 진공 부품 및 Sputtering용 Alloy Target
▷ 자체 제작품인 효율적이고 신뢰성 높은 Sputtering용 Cathode 및 Alloy Target, 유/무기 증착원 및 관련 부품을 공급.
Sputtering Cathode
- Type : Planar, Round, Hexagon, Cylindrical type magnetron gun
- Size : up to 2,000mm
- Target Material : Metal, Oxide, TCO.
- Size : up to 2,000mm
- Target Material : Metal, Oxide, TCO.
Sputtering Target
- Target Material : Metal (Silver, Gold, Titan Color용)
Evaporation Source
- Type : Point cell, Linear cell
- Volume : Host and Dopant (from 3cc ~ )
- Material : Organic and Inorganic material
- Volume : Host and Dopant (from 3cc ~ )
- Material : Organic and Inorganic material