真空设备配件及溅射用 Alloy Target
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产品简介 真空设备配件及溅射用 Alloy Target
▷ 我们提供自制的有效率性与可靠性的溅射用 Cathode, Alloy Target, 有/无机沉积材料以及相关配件。
Sputtering Cathode
- Type : Planar, Round, Hexagon, Cylindrical type magnetron gun
- Size : up to 2,000mm
- Target Material : Metal, Oxide, TCO.
- Size : up to 2,000mm
- Target Material : Metal, Oxide, TCO.
Sputtering Target
- Target Material : Metal (Silver, Gold, Titan Color用)
Evaporation Source
- Type : Point cell, Linear cell
- Volume : Host and Dopant (from 3cc ~ )
- Material : Organic and Inorganic material
- Volume : Host and Dopant (from 3cc ~ )
- Material : Organic and Inorganic material